Soothing Mask Holy Land Cosmetics Double Action Mask
- Characteristics
- Description
- How to use
- Ingredients
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Age:
18+
Brand: Holy Land Cosmetics
Line: double action
Product Type: face mask
Product Properties: cleansing
Face Mask Type: clay
When To Use: universal
Gender: for women
Classification: professional
Country TM: Israel
Made in: Israel
Proper care for oily skin prone to various breakouts and inflammations involves the use of a comprehensive range of cosmetic products. The professional Double Action Mask by Holy Land Cosmetics ensures deep cleansing and pore-tightening, normalizes the function of sebaceous glands, and reduces inflammation. This mask is effective in combating acne and even demodicosis, by drying out surface inflammations, alleviating irritation, and accelerating the healing process of damaged areas.
The foundation of the Holy Land Cosmetics Double Action Mask is white clay (kaolin), which facilitates intensive exfoliation of the dead epithelial layer, absorbs excess oil, and diminishes pores. Colloidal sulfur is used as an antiseptic and antibacterial agent, optimizing the function of sebaceous glands. Chamomile extract provides a soothing and anti-inflammatory effect, while allantoin softens the skin and stimulates active cell renewal. The mask formula also includes drying calamine powder.
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Apply a thin, even layer of the mask to the problem areas and leave it on for 20 minutes. Rinse thoroughly with water using sponges, then apply a moisturizing product. Use no more than twice a week. Do not apply the mask to the eyelids. It may cause redness and skin irritation in individuals with sulfur sensitivity.
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Water (Aqua), Calamine, Propylene Glycol, Kaolin, Zinc Oxide, Hydrogenated Polyisobutene, Sulfur, Cetyl Alcohol, Allantoin, Chamomilla Recutita (Matricaria) Flower Extract, Chamomilla Recutita (Matricaria) Flower Oil, Bisabolol, Sorbitol, Cetearyl Alcohol, Polysorbate 20, PEG-40 Hydrogenated Castor Oil, Hydr Sodium Lauryl Sulfate, Methylparaben, Propylparaben, 2-Bromo-2-Nitropropane-1,3-Diol.
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